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Samyang to produce advanced photoresist material

Collected: 2018.01.25

Distributed: 2018.01.26

Source: Go Direct

Samyang Corporation said on Tuesday this year will mark the start of full-scale commercial production of its oxime photoinitiator compound, a key material used in the manufacturing of photoresist for micro-patterning of semiconductor circuits and thin film transistors in displays.

The company secured commercial rights to the co-developed solution under a technology transfer contract signed with state-run Korea Research Institute of Chemical Technology.

The two organizations spent six years leading the commercial development of the new compound, which has lower production costs and better physical properties including photosensitivity and transmission than its predecessor.

Nine patents are already registered in South Korea and overseas and another 17 are pending. The company has produced prototypes since 2016 and is poised to market the product to domestic and foreign photoresist manufacturers this year.

The new product developed under industry-academia will help expand Samyang’s global reach and the company will continue open innovation to develop advanced specialty chemicals, said a company official.

By Hwang Soon-min and Minu Kim

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